基于微细加工技术的微透镜阵列制备
时间:2019-10-20 15:44 来源:毕业论文 作者:毕业论文 点击:次
| 摘要： 随着科学技术的飞速发展，现在仪器设备朝着光、机、电高度集成的方向发展，微机电系统（MEMS）技术已经成为当今先进微细加工技术的主流技术。将MEMS技术应用在微光学技术中所制造出的微透镜阵列有着体积小、重量轻、便于集成、阵列化等优点。本课题基于LIGA（X光光刻，电铸，模压）工艺的微透镜阵列制备原理，即通过两次移动X光曝光技术（第一次移动X光光刻后，将掩膜板旋转90°进行第二次移动X光光刻），以聚甲基丙烯酸甲酯(PMMA)为正光刻胶，在PMMA基板上制作微透镜阵列。设计并制备微透镜的掩膜图形，建立仿真模型，并编程仿真出第一次X光曝光后的单个微透镜截面形状。利用同步辐射光源进行两次X光光刻制备PMMA微透镜阵列。并利用聚二甲基硅氧烷（PDMS）转模工艺，从PMMA模具制备了廉价的PDMS微透镜阵列，并对微透镜阵列进行了形貌测试。测试结果表明，复制的PDMS微透镜直径约300μm，具有较光滑的表面。41170 毕业论文关键词：微细加工；微透镜阵列；X光光刻；PMMA；PDMS Fabrication of micro lens array based on micro fabrication technology Abstract: With the rapid development of science and technology, the development of the instrument and equipment toward the direction of light, machine and electric power, micro electro mechanical system (MEMS) technology has become the mainstream technology of the advanced micro processing technology. The micro lens array fabricated by MEMS technology in micro optical technology has the advantages of small size, light weight, easy to integrate, and so on. This paper based on Liga (X-ray lithography, electroforming, molding) process of micro lens array of preparation principle, that is, through the two mobile X light exposure (after the first mobile X-ray lithography, the mask membrane plate to rotate by 90 DEG to the second mobile X-ray lithography), poly (methyl methacrylate) (PMMA) positive photoresist, on PMMA substrate making micro lens array. Design and fabrication of micro lens mask graphics, the simulation model is established, and the simulation of the first X light exposure of a single micro lens cross section shape. The PMMA micro lens array was prepared by two X lithography using synchrotron radiation light source. A low-cost PDMS micro lens array was fabricated from the PMMA mould by using poly two methyl silicone (PDMS) transfer molding process, and the morphology of the micro lens array was tested. Test results show that the duplicate PDMS micro lens has a smooth surface, with a diameter of about 300μm. Keywords: Microfabrication；Micro lens array; X-ray lithography; PMMA; PDMS 目录 摘要 i Abstract i 1 绪论 1 1.1 微透镜阵列研究背景 1 1.2 微透镜阵列研究现状和发展趋势 2 1.3 制备微透镜阵列的MEMS技术简介 3 1.4 研究目的及意义 4 2 微透镜阵列制备原理 6 2.1 微透镜阵列的制备原理 6 2.2 微透镜阵列的材料选择 8 3 微透镜阵列成形仿真与制备 10 3.1 微透镜阵列的仿真设计 10 3.2 利用LIGA方法制备PMMA微透镜阵列 21 3.3 利用原始模具进行PDMS转模 24 4 微透镜阵列的形貌测试 26 5 结论 30 致谢 32 (责任编辑：qin) |