摘要随着现代制造业的快速发展，薄膜所发挥的作用越来越显著，普及程度越来越高，其强度和硬度均达到前所未有的水平，良性的循环促使人们对薄膜性能提出了更高的性能要求。室温蠕变是导致薄膜性能下降，甚至破坏薄膜的一种重要因素，科学和有效的掌握薄膜室温蠕变机制以及影响因素是保护薄膜的最佳方法。W作为一种耐高温材料，具有高熔点和高的硬度，其应用范围及其广泛。但其在高温下容易发生氧化反应，降低材料性能，Mo同样作为一种耐高温材料，与W结合形成化合物，其熔点、硬度、耐磨性，同时具有较强的抗氧化能力，WN中掺杂一定含量的Mo将有望形成更加稳定，高硬度和低耐磨系数，耐高温的复合薄膜。86877

本文主要通过采用不同功率在磁控溅射仪上制备出W和Mo不同含量比的复合薄膜，并利用EDS和XRD等设备测定薄膜的成分，微观结构和晶粒尺度。实验表明在W靶功率固定的条件下，随着Mo靶功率的增加，薄膜中Mo含量逐渐增大。掺杂的Mo元素先与WN形成置换固溶体，达到饱和后过剩的Mo与N结合生成Mo2N。通过纳米压痕仪，采用恒载荷法在不同载荷下，测出薄膜的饱载时间与压入深度的关系，从而推导出WMoN复合薄膜室温蠕变规律，即在同等条件下，薄膜硬度随蠕变载荷的增加而增大，而蠕变应变速率敏感性则随着蠕变载荷的增大而减小。

毕业论文关键词：纳米压痕、室温蠕变、WMoN复合薄膜

Abstract With the rapid development of modern manufacturing, films play a more and more significant role 。It is widely use, nowadays。 And its strength and hardness have reached an unprecedented level, high prompter people to the higher properties of films。 It is the temperature creep that leading to either performance degradation, or even destroy the films。 It is the best way to protect the films by mastering the scientific and effective mechanisms and grasping the relative factors。 W is regarded as a refractory material, which has high melting point and high hardness, and its widely use。 But it will be oxidation at high temperatures, reducing material properties。 Mo is a kind of refractory material。 When W combines to form a compound, which not only has a high melting point, hardness and wear resistance, but also has strong antioxidant capacity。 Doping certain content of Mo into WN is expected to form a more stable, high hardness, low wear coefficient and high temperature composite films。

This paper mainly through the use of different power W is prepared in a magnetron sputtering apparatus, Mo composite films with different content ratio, and the use of EDS, XRD and other equipment Determination of film composition, microstructure and grain size。 The w target in the condition of fixed power, with the increase of Mo target power, the content of Mo thin film increased gradually。 Mo doped and WN form substitution solid solution saturated free Mo will combine with n to generate mo2n。 by nano indentation method, by constant load under different load, measure the film holding time, the relationship between the indentation depth, which is derived from the WMoN composite films at room temperature creep the law, in the same conditions, the hardness of the films increased with the creep load increases, and the creep strain rate sensitivity decreases with the increase of creep load。

Keywords: Nano indentation; room temperature Creep; WMoN composite films。

目  录

第一章绪论 1

1。1薄膜的概述 1

1。1。1薄膜的定义 1

1。1。2薄膜的特征 2

1。1。3薄膜的用途 2

1。2蠕变概述