摘要随着电子信息产业的快速发展,为了提高数据的传输速率和节省空间,一个显著的趋势是电子元器件的工作频率和集成度不断的在提高。作为电子元器件关组成部分之一的磁性元器件必然要适应这种趋势而向高频化、小型化方向发展。工作在1GHz以上的高磁导率磁性材料是发展磁性电子器件,进而实现电子系统大集成的瓶颈。67160

想要获得高磁导率磁性薄膜,就要提高面内各向异性,然而一般的薄膜不会自发产生面内各向异性,需要采用各种辅助诱导手段,倾斜溅射就是一种诱导手段。倾斜溅射不同于一般的垂直磁控溅射,它是使得样品偏离正靶位而发生的磁控溅射现象。本实验通过改变样品的倾斜角来实现倾斜溅射,倾斜溅射可以提高薄膜的各向异性。本文研究的对象是CoZr薄膜。CoZr薄膜属于过渡族金属-金属型(TM-M型)非晶态合金薄膜。这种薄膜具有较高的饱和磁化强度和较高的晶化温度及Curie温度,与此同时具有优良的软磁特性。本次毕业设计的主要目的是首先了解磁控溅射的原理,以及何为倾斜溅射,然后通过测量在不同角度样品台上的样品的磁滞回线,比较各向异性场等磁性参数随倾斜角度的变化。

毕业论文关键词 磁性薄膜,各向异性,倾斜溅射, CoZr薄膜,磁性参数

毕业设计说明书(论文)外文摘要

Title   The tuning of anisotropy and microwave characteristics of soft magnetic film by oblique sputtering   

Abstract

With the rapid development of electronic information industry, in order to improve the data transfer rate and save space, a significant trend is that the electronic components operating frequency and integration are constantly increasing. As part of one of the electronic components, the magnetic component is bound to adapt to this trend and towards high frequencies, miniaturization direction .Work in more than 1 GHz high permeability magnetic material is the bottleneck that the development of magnetic electronic components, thus achieving a large integrated electronic system.

To get a high permeability magnetic film, it is necessary to improve the in-plane anisotropy, however, the film does not spontaneously general plane anisotropy, and it requires the use of various auxiliary induction means, such as inclined sputtering. Unlike the vertical magnetron sputtering, inclined sputtering is a phenomenon that makes the sample deviate from target then occurred magnetron sputtering. The experiment by changing the sample tilt angle to achieve the Inclined sputtering, and Inclined sputtering can improve the film anisotropy. This study focused on CoZr film. CoZr film belongs to the transition metal - metal type (TM-M-type) amorphous alloy films. This film has a high saturation magnetization and higher crystallization temperature and the Curie temperature, at the same time it has excellent soft magnetic properties. The main purpose of graduation project is to understand the principle of magnetron sputtering and sputtering what is Inclined, and then by measuring hysteresis loop of the samples at different angles of sample stage, and then compared magnetic anisotropy field changes with the Inclined angle.

Keywords  magnetic thin film, anisotropy, oblique sputtering, CoZr thin film, magnetic parameters

目录

1  绪论 1

1.1 软磁材料 1

1.2 磁控溅射 4

1.3 倾斜溅射 7

1.4 VSM(振动样品磁强计) 7

1.5 高频软磁薄膜制备中的问题及解决方案 8

1.6 实验内容

上一篇:溅射气压对FeCo基软磁薄膜材料磁性能影响的研究
下一篇:SuperForm轴承毂预锻过程中折叠缺陷的有限元模拟研究

Incoloy800H晶界结构特征优化调控

基于反铁磁稀释效应的交...

基于能量-冶金联合调控的...

CVD二维材料异质结发光二...

光子晶体的TiO2基薄膜太阳...

钒氧化物微晶玻璃合成及...

石墨烯基材料结构调控对...

张洁小说《无字》中的女性意识

新課改下小學语文洧效阅...

网络语言“XX体”研究

老年2型糖尿病患者运动疗...

LiMn1-xFexPO4正极材料合成及充放电性能研究

安康汉江网讯

我国风险投资的发展现状问题及对策分析

互联网教育”变革路径研究进展【7972字】

ASP.net+sqlserver企业设备管理系统设计与开发

麦秸秆还田和沼液灌溉对...