摘要:随着微电子技术和集成化的发展要求,铁电薄膜已成为世界高新技术研究的前沿与热门。铁电薄膜在被广泛的使用于制成存储器同时,亦被预测需求量将逐年提高,但铁电薄膜就目前而言仍存在许多问题。例如,铁电薄膜在薄膜化时引发的界面问题,薄膜存在的疲劳特性以及保持性能等。
本论文采用化学溶液沉积法,通过制备反应前驱体进行旋涂、沉积、退火制成Bi6Fe2Ti3O18铁电薄膜。利用XRD与SEM技术进行薄膜物相与形貌表征,采用铁电测试仪进行铁电薄膜的铁电性,漏电性,疲劳特性和保持性能的测试。通过对实验结果的分析,可知:1.Bi6Fe2Ti3O18铁电薄膜具有良好的电滞回线;2.Bi6Fe2Ti3O18铁电薄膜存在疲劳现象,但可一定程度恢复;3.Bi6Fe2Ti3O18铁电薄膜的保持性能良好。
关键词:铁电薄膜;化学溶液沉积法;疲劳;保持性能
Abstract:Ferroelectric thin film has attached much attention due to the microelectronics technology and integrated development in recently years. The most one of significant application of ferroelectric thin film was used as memory devence uints, and predictable demand is still rising year by year However, there are still many problems with ferroelectric films. Such as the issue of interface during filming, fatigue phenomenon and retention performance.
In this paper, Bi6Fe2Ti3O18 ferroelectric films were prepared on Pt/Ti/SiO2/Si (100) substrate by chenical solution deposition route. Then, XRD and SEM were used to characterize the ferroelectric thin films. Finally, the ferroelectricity, leakage current, fatigue properties and retention performance of the ferroelectric thin films were measured by ferroelectric tester system. Carefully analyze the experimental data and obtain the following three results: first, Bi6Fe2Ti3O18 ferroelectric film has a well-defined hysteresis loop , second, Bi6Fe2Ti3O18 ferroelectric film shows fatigue phenomenon and can rejuvenation after larger voltage stimulation, third, the Bi6Fe2Ti3O18 ferroelectric film present good retention performance.
Keywords: ferroelectric thin film; chemical solution deposition method; fatigue; retention performance
目录
第一章绪论 1
1.1铁电材料研究进展 1
1.2铁电存储器的发展 2
1.3Bi6Fe2Ti3O18晶体结构 3
1.4Bi6Fe2Ti3O18物理性能 4
1.4.1铁电性 4
1.4.2磁性 5
1.5Bi6Fe2Ti3O18铁电薄膜的研究意义 6
1.6化学溶液法基本特性 6
1.7铁电薄膜疲劳特性研究进展 7
1.8铁电薄膜的保持性能研究 8
第二章Bi6Fe2Ti3O18薄膜制备与实验分析 9
2.1Bi6Fe2Ti3O18薄膜制备实验所需原料及设备 9
2.1.1实验所需原料 9
2.1.2实验所需设备 9
2.2Bi6Fe2Ti3O18薄膜制备 9
2.2.1前驱体溶液的配置 9
2.2.2衬底的选择与冲洗 10
2.2.3铁电薄膜的制备 10
2.2.4电极的制备 10
2.3Bi6Fe2Ti3O18薄膜的物相与微观结构表征