毕业设计说明书中文摘要干涉法测量表面面形作为重要的缺陷检测手段，在工业生产领域的需求日益增长，但数字干涉仪的测量范围有限。因此在保持干涉仪高精度的前提下，拓展测量范围成为了重要的研究方向。81754

本文针对斜入射干涉法测量具有较大面形偏差待测件的表面面形进行了仿真实验和测量研究。仿真实验用Zemax搭建了斜入射干涉测量光路及对应正入射光路，测量了简单曲面及Zernike多项式拟合的复杂曲面，并用Matlab 对斜入射测量结果插值展开，与正入射测量相比较，研究了斜入射测量引入误差的因素，并用仿真结果指导了高反镜及蓝宝石基片的测量研究。高反镜测量平均绝对误差在0。0356λ，平均相对误差为4。44%。在斜入射下可测量最大面形偏差为8 的蓝宝石基片，拓展了数字干涉仪0～5的测量范围。

毕业论文关键词  蓝宝石基片 面形测量 斜入射 Zemax仿真 大像差

毕业设计说明书外文摘要

Title    Simulation and Experimental Research of Surface Shape  Measurement on Sapphire Substrate                             

Abstract  As an important means of product defect detection, the demands for interferometric measurement of surface shape has been increasing rapidly in the industry。 However, the measuring range of digital interferometer is limited。 In order to maintain the high accuracy of interferometer, expanding the measuring range has become an important research direction。

The paper mainly introduce the simulation and experimental research of oblique incidence measuring the surface with large aberrations。 The simulation employs Zemax to set up the oblique incidence test and the according normal incidence test。 The simulation measures both simple surfaces and complex surface which is fitted  by Zernike polynomial。The results of oblique incidence test is expanded by interpolation according Matlab, and compare with the results of normal incidence test。 The error factors of the oblique incidence test are studied, and the simulation results are used to guide the measurement of high reflectivity mirror and sapphire substrate。 The average absolute error value of high reflectivity mirror measurement results is 0。0356λ, and the average relative error value is 4。44%。 Sapphire substrate with 8 surface deviation can be measured based on oblique incidence。 Oblique incidence expands the measuring range of digital interferometer with measuring range of 0～5。

Keywords   sapphire substrate; surface shape measurement; oblique incidence test; Zemax simulation; large aberrations

目   次

1  绪论 1

1。1  引言 1

1。2  研究现状 1

1。3  本文主要研究内容 4

2  设计思路与测量原理 6

2。1  斜入射干涉测量光路 6

2。2  测量原理 6

3  仿真实验 9

3。1 Zemax光路搭建 9

3。1。1正入射光路搭建 9

3。1。2 斜入射光路搭建 11

3。2不同面形待测镜测量 14

3。2。1球面反射镜测量 14

3。2。2 Zernike多项式拟合面形(离焦项10)测量 15