摘要传感器市场正在逐步被MEMS传感器占据，并逐步取代机械传感器，已得到电子消费产品、航空航天、汽车、化工、机械、医药等领域的重视。在目前的导航系统中，电子罗盘扮演着十分重要的角色，所以磁阻传感器在定位系统中受到的关注越来越多。86378

本文主要研究基于MEMS技术的磁阻传感器线圈制备技术，首先研究MEMS磁阻传感器的工作原理和相关器件，然后制备MEMS磁阻传感器。主要是基于UV-LIGA工艺技术，可以解决制备高深宽比的加工技术难题，通过光刻、微铸造加工技术，实现高深宽比的微结构。

通过做实验我们得出了以下结论：

1：设计方面：我们通过CAD设计出器件的结构，在一片衬底上设计具有不同尺寸的MEMS磁阻传感器图形。

2：制备传感器：利用UV-LIGA技术制备传感器。经过基底处理、甩胶、预烘、曝光、后烘、显影、溅射、电镀等工艺过程实现传感器的制备。首先覆盖种子层，接着涂覆光刻胶，通过工艺技术刻出设计好的图案接着再电镀上金属镍；接着重复两次之前的工艺继续电镀金属，最后得到传感器微型线圈。

3：工艺优化：要想得到好的器件性能就需要对工艺优化，包括优化工艺的工序，工序里的每部所涉及到的数据，工艺所需的材料例如光刻胶的选择等。光刻胶的选择对工艺的影响很深，应该不断的优化所用的光刻胶。

最后制得磁阻传感器，其灵敏度高、体积小、功耗低为磁阻传感器的优点。磁阻传感器在卫星定位和航海方面具有突出的优点，所以研究磁阻传感器是十分有必要的。

毕业论文关键字：MEMS；磁阻传感器；UV-LIGA

Abstract Sensor market is gradually occupied MEMS sensors, and gradually replace the mechanical sensor has been emphasis on consumer electronics, aerospace, automotive, chemicals, machinery, medicine and other fields。 In the current navigation systems, electronic compass plays an important role, so being in the magnetoresistive sensor positioning system more and more attention。

In this paper, based on MEMS technology magnetoresistive sensor coil preparation technology, the first magnetoresistive sensor MEMS research works and related devices, then prepared MEMS magnetoresistive sensor。 Mainly based on UV-LIGA process technology for preparing high aspect ratio can solve the technical problems of processing, by photolithography, micro casting processing technology, to achieve a high aspect ratio microstructures。

By doing experiments we reached the following conclusions:

1: Design: We design through CAD structure of the device, in a magnetoresistive sensor MEMS substrate design patterns of different sizes。

2: Preparation of the sensor: the use of UV-LIGA technology to prepare a sensor。 Treated substrate, plastic rejection, pre-bake, exposure, post-baking, prepare a sensor developing, sputtering, plating and other processes to achieve。 First, cover the seed layer, then coated with a photoresist, carve patterns designed by technology followed by plating on metallic nickel; then repeats the process twice before continuing plated metal, and finally get miniature sensor coil。

3: Process optimization: To get good performance of the device is required for process optimization, including optimization of process steps, each step in the data involved, the required process materials such as photoresist selection。 The impact on the process of selection of the photoresist deep, should continue to be used to optimize the photoresist。

Last prepared magnetoresistive sensor, high sensitivity, small size, low power consumption advantages of the magnetoresistive sensor。 Magnetoresistive sensor has distinct advantages in terms of satellite positioning and navigation, the study magnetoresistive sensor is very necessary。 UV-LIGA的MEMS磁阻传感器芯片的线圈工艺研究:http://www.youerw.com/cailiao/lunwen_105062.html