摘要本文主要对不同厚度的Ta缓冲层、不同比例的Dy掺杂以及不同倾斜溅射角度对FeCo软磁薄膜的各向异性的影响展开了研究。分别利用振动样品磁强计(VSM)、能谱仪(EDS)、扫描电子显微镜(SEM)对薄膜样品进行了静态磁性能、表面形貌及物相成分的表征。33129
研究发现，在FeCo体系样品中，矫顽力随Ta厚度变化，先增大再减小后增大，各向异性场随缓冲层厚度增加先增加后减小，在镀Ta时间为5min时，FeCo的软磁性能最优，此时Hce=25 Oe，Hch=9 Oe，HK=38.5 Oe；随着Dy的掺杂量的增加，样品的易轴和难轴的矫顽力均表现先增加后减小的现象，样品的各项异性场出现先增加后减小的非单调变化现象；随着倾斜角度的增大，样品的易轴和难轴的矫顽力都增大，与矫顽力类似的，样品的各向异性场出现随角度增大不断增加的现象。
毕业论文关键词 磁控溅射 磁各向异性 FeCo薄膜 Dy掺杂 倾斜溅射
外文摘要Title  Sputtered Soft Magnetic Metal Thin Film Magnetic Anisotropy Construction 
Abstract
This paper studied the effect of anisotropy on FeCo soft magnetic thin film that the different thickness of Ta buffer layer and doped with different proportions of Dy and different angle of oblique sputtering. Vibrating sample magnetometer (VSM), energy dispersive spectroscopy (EDS), scanning electron microscopy (SEM). were used to characterize the films component that static magnetic properties, surface morphology and physical phase.
The study found that in FeCo system sample, with the increase of the thickness of buffer layer, the coercivity decreases between two periods of  increasing, while the anisotropy field increases first and then decreases. When the buffer layer plated for 5min, the soft magnetism of  FeCo film haves the optimal performance: Hce = 25 Oe, Hch = 9 Oe, HK = 38.5 Oe; With the increase of Dy doping amount,the easy axis and hard axis of the sample which the coercivity and the anisotropy field showed the nonmonotonic change phenomenon that increased first and then decreased. With the tilt angle increases, the easy axis and hard axis of the sample which the coercivity are increased, similar coercivity, anisotropy field of the sample appears to increase with increasing angle.
Keywords: Magnetron sputtering; magnetic anisotropy; FeCo thin film; Dy doped; oblique sputtering.
目   次
1  绪论    1
1.1  引言    1
1.2  磁各向异性分类    1
1.2.1  磁晶各向异性    1
1.2.2  磁场感生各向异性    2
1.2.3  应力各向异性    2
1.2.4  交换各向异性    2
1.2.5  表面和界面磁各向异性    2
1.2.6  薄膜中的形状各向异性    3
1.3  软磁金属薄膜    3
1.3.1  单层膜    3
1.3.2  多层膜    3
1.3.3  软磁薄膜的重要参数    4
1.4  倾斜溅射技术    5
1.5  非磁元素掺杂    6
1.6  本文的研究意义与内容    6
2  实验过程和方法    8
2.1  实验样品的制备与设计    8
2.2  磁控溅射技术    9
2.2.1  磁控溅射原理    9
2.2.2  磁控溅射设备介绍    10
2.3  振动样品磁强计（VSM）    10
2.4  能谱仪（EDS）    11
3  薄膜样品磁性能分析    13
3.1  前期工作    13
3.2  不同厚度的Ta缓冲层对FeCo体系各向异性的研究    14 溅射软磁金属薄膜磁各向异性构建:http://www.youerw.com/cailiao/lunwen_30044.html