摘要地磁场是存在于地球表面以及近地空间的微弱磁场。作为一种天然的磁场，它在海上导航、通讯、地质勘探、地震预报，等众多领域有着重要的作用。基于此，准确高效的测量地磁场也就显得至关重要。MEMS磁阻传感器是基于MEMS技术发展而来的新型传感器，具有体积小，性能高，替换方便，成本低等诸多优点，有着广阔的应用前景。MEMS磁阻传感器的发展离不开MEMS技术的提高，通过探讨研究新型MEMS磁阻传感器的制备工艺，优化MEMS磁阻传感器中非晶丝定位技术，为商业化应用打下基础。MEMS技术包含传统硅基微加工工艺和3维体加工和表面加工技术（包括LIGA，深反应离子刻蚀，激光刻蚀等新型加工工艺）。86380

本文研究内容主要包括基于UV-LIGA技术的MEMS磁阻传感器的设计，并通过MEMS微加工技术进行微型磁阻传感器的加工，主要内容有以下几个部分：

1。基于UV-LIGA技术的微型磁阻传感器的设计，通过CAD等绘图软件，设计出磁阻传感器的原型；

2。基于UV-LIGA技术的磁阻传感器的制备，利用光刻、溅射、电镀和刻蚀等微纳米加工工艺，构建出MEMS磁阻传感器的主题结构；

3。利用微纳米加工技术中的高精度特点，制备出具有微米级别精度的定位孔，解决了磁阻传感器非晶丝的定位难题 

4。 通过湿法释放工艺形成整体的MEMS磁阻传感器。

毕业论文关键词：磁阻传感器，微机电系统，UV-LIGA，微电铸，光刻， 

Abstract Earth's magnetic field is present in the Earth's surface as well as the weak magnetic field of near-Earth space。 As a natural magnetic field, it plays an important role in maritime navigation, communication, geological exploration, earthquake prediction, and many other fields。 Based on this, accurate and efficient measurement of Earth's magnetic field also is crucial。 MEMS magnetoresistive sensor is based on new sensor MEMS technology evolved, with small size, high performance, easy replacement, low cost advantages, has broad application prospects。 MEMS development is inseparable from improving magnetoresistive sensor MEMS technology, technology of preparation by exploring new MEMS magnetoresistive sensor, magnetoresistive sensor to optimize MEMS amorphous wire positioning technology for commercial application basis。 MEMS technology includes traditional silicon micromachining technology and three-dimensional body processing and surface processing technologies (including LIGA, deep reactive ion etching, laser etching and other new processing technology)。

This paper mainly includes the design MEMS magnetoresistive sensor based on UV-LIGA technology, and micro-machining magnetoresistive sensor by MEMS micro-machining technology, the main contents of the following sections:

1。 Design UV-LIGA technology based on micro-magnetoresistive sensor through CAD and other graphics software, design a prototype magnetoresistive sensor;

2。 Preparation of UV-LIGA technology magnetoresistive sensor based on the use of lithography, sputtering, plating and etching micro-nano processing technology, MEMS structures constructed theme magnetoresistive sensor;

3。 The use of micro-nano technology in precision machining characteristics, prepared hole having micron level positioning accuracy, to solve the magnetoresistive sensor amorphous wire positioning problem;

4。 The formation of the overall MEMS magnetoresistive sensor by a wet release process。

Keywords: Magnetoresistive sensor, MEMS, UV-LIGA, micro electroforming, photolithography,

目  录

第一章 绪论 1

1。1 MEMS技术简介 1

1。2 MEMS工艺技术的现状与发展