摘要近几年来，与水的接触角大于150°的超疏水表面引起了极大的关注，水滴可以很容易从表面滚落，带走表面污染物。因此它在自清洁材料、微流体装置以及生物材料等许多领域中有着极其重要的应用前景。目前，通过剪裁表面的微细结构，人们己经制备出了许多人工超疏水表面。67242

    以正硅酸乙酯（TEOS）为前驱体、氨水为催化剂，采用溶胶凝胶提拉涂覆的方法制备了具有超疏水性能的薄膜，同时，对影响薄膜透光率的因素，进行了进一步的分析，并采用恒温恒湿的方法测试薄膜的耐候性。实验制备出的超疏水薄膜具有151°的静态接触角，滑动角为3°，并且在可见光波段范围内的透光率达到90%以上。恒温恒湿30天实验后，薄膜接触角基本下降不大，说明其具有良好的耐温耐湿性能，具有广阔的实际应用前景。

毕业论文关键词  超疏水 透明  SiO2薄膜  提拉法  

毕业设计说明书（论文）外文摘要

Title    Study and preparation of transparent SiO2 nano super  Hydrophobic coating                                                  

Abstract

In the past few years, surfaces with water contact angle larger than 150° have received a lot of research attention, water can easily be rolled off this surface and take away the pollutants, due to their important applications ranging from self-cleaning materials to microfluidic devices and biological materials. Up to now, artificial superhydrophobic surfaces have been fabricated by tailoring micro-structure of surface. 

In this paper , we used the mixture of TEOS, EtOH and H2O as a precursor, NH4OH (13.8M)as a catalyst to obtain silica films through dip-coating method. Different modifier were used to obtain superhysdrophobic films. At the same time, further analysis of the factors affecting the film transmittance was done, and the humidity test was carried out to study the resistance of the films against the humidity and the temperature. The superhydrophobic films were prepared with an static contact angle of 151° and  sliding angle of 3 °, the transmittance in the visible range is above 90%. After humidity test for 30 days, the contact angle of the deposited films decreased slightly, which showed that it has good resistance to temperature and humidity and the wide application in the future.

Keywords superhydrophobic transmittance silica film dip-coating 

目录

1  绪论 1

1．1  引言 1

1．2  超疏水表面的基本理论 2

1.2.1  静态接触角 2

1.2.2  Wenzel模型 3

1.2.3  Cassie模型 3

1.2.4  Wenzel模型和Cassie模型之间的关系 4

1.2.5  接触角滞后和滚动角 4

1．3  超疏水表面制备方法 6

1.3.1  模板印刷法 6

1.3.2  溶胶凝胶法 6

1.3.3  蒸汽诱导相分离法 7

1.3.4  模板挤压法 7

1.3.5  激光和等离子体刻蚀法 8

1.3.6  腐蚀法 8

1.3.7  电纺法