摘要纳米多孔材料是一种兼具功能和结构双重属性的新型工程材料，不仅保留了金属的可焊性、延展性、导电性等特性，还具有高比表面积、良好化学稳定性和高的屈服强度等性能特点。纳米多孔金属可望在催化、传感、驱动和热交换等领域获得广泛应用。随着多孔金属材料制备技术的发展，采用简单绿色的方法制备具有高比表面积的多孔金属材料成为近年来的研究热点。本文利用磁控溅射技术制备了Al/Ti/Si基片，利用二次阳极氧化技术在0.3M草酸、40V电压、室温条件下制备了Ti/Si基多孔氧化铝薄膜,又在氧化铝模板上磁控溅射30min铜，在2.0wt%NaOH溶液中常温浸泡20min去除氧化铝模板，得到无支撑的多孔铜。用激光共聚焦显微镜对氧化铝模板和多孔铜进行表征。不同条件下，得到氧化铝模板最厚可达117μm，孔径不均一。得到的多孔铜的铜棒高度也可达100μm。64340

毕业论文关键词   磁控溅射  氧化铝模板  二次阳极氧化  多孔铜

毕业设计说明书（论文）外文摘要

Title  On the micro-structure of energetic devices in situ synthesis technology research

Abstract Nano-porous material is a new construction materials,it has dual properties of both structure and function, not only retains the metal weldability, ductility, conductivity and other characteristics, but also has high specific surface area, good chemical stability and high yield strength and other performance characteristics.Nano-porous metal will be used widely in catalysis, sensing, drives, hot-swap and other fields . With the development of preparation techniques of porous metal material ,a simple and green method for preparing a porous metal material that have a high of the specific surface area has become a research hotspot in recent years. In this paper, Al / Ti / Si substrate was prepared by magnetron sputtering . Porous alumina film was prepared by two-step anodization in 0.3M oxalic acid and voltage of 40V under room temperature. Then copper was spurted on alumina films for 30 Minutes using magnetron sputtering .The resulting film was soaked in 2.0wt% NaOH for 20 Minutes to removal alumina film for getting porous copper without support. Finally , alumina film and porous copper was characterized using laser scanning confocal microscope . Maximum thickness of alumina film is 117μm under different conditions .The aperture of alumina film is inconsistent . Maximum rod height of Porous Copper is 100μm.

Keywords   Magnetron sputtering   Alumina Template   Two-step anodization  Porous Copper

1  绪论 1

1.1  多孔纳米材料的研究进展 1

1.1.1  制备纳米材料的方法 1

1.1.2  纳米材料的应用 2

1.2  原位合成技术的研究现状及发展前景 3

1.2.1  原位合成技术的研究现状 3

1.2.2  原位合成技术的发展前景 3

1.3  以硅基氧化铝薄膜为模板电化学制备金属纳米材料的相关现状 4

1.4  本论文研究背景及研究内容 5

1.4.1  研究背景 5

1.4.2  本实验研究内容 6

2  硅基氧化铝的薄膜的制备 7

2.1  实验原理 7

2.1.1  磁控溅射镀膜 7

2.1.2  铝阳极氧化形成多孔氧化铝薄膜