摘要软磁薄膜在高集成器件中具有潜在的应用价值而受到研究人员的广泛关注。对于这些软磁薄膜的基本要求是具有高的饱和磁化强度(4πMs)，低的矫顽力(Hc)，高的电阻率(ρ)以及合适的各向异性场(Hk)。在这些材料中，FeCo合金因其具有高的饱和磁化强度而成为一种优势材料。但FeCo合金薄膜具有高的磁晶各向异性以及高的饱和磁致伸缩系数，难以获得良好的软磁特性和面内单轴磁各向异性。因而，改善FeCo合金薄膜的软磁特性与高频响应是一项重要而有意义的工作。67159

在本论文中，我们通过第三方元素添加的方法制备了一系列的FeCo基合金薄膜，通过改变溅射气压得到三组薄膜样品，分别研究了溅射气压对这些薄膜的静态与动态磁性的影响。主要结论如下：

（1）溅射气压升高，FeCoB薄膜的各向异性场和共振频率有最小值，初始磁导率有最大值，矫顽力和阻尼系数单调递减，阻尼系数的可调谐性显示溅射气压可有效的改变薄膜的高频特性。

（2）FeCoN薄膜的静态软磁特性和微波特性都和溅射气压密切相关。气压升高，共振频率单调减小，初始磁导率单调增加，矫顽力和阻尼系数会达到最小值。共振频率表现出较好的可调谐性。

（3）根据FeCoAlO薄膜的磁导率谱，气压升高到2mTorr初始磁导率和阻尼系数会达到最小值，而共振频率和各向异性场会达到最大值，这和溅射气压导致的薄膜内应力有关。

毕业论文关键词：溅射气压， FeCo基薄膜， 静态磁性， 动态磁性  

毕业设计说明书（论文）外文摘要

Title  The research on the influence of sputtering gas pressure on the magnetic properties of FeCo alloy soft magnetic thin films                                     

Abstract Nowadays，Soft magnetic thin films have been studied intensively because of their potential applications in highly integrated devices.The basic demands for these films are high saturation magnetization 4πMs，low coercivity Hc，high electric resistivity ρ，and appropriate anisotropy field Hk. Among various materials，FeCo alloys are important materials for their high saturation magnetization. However，it is difficult for FeCo alloys thin films to achieve low coercivity and in-plane uniaxial magnetic anisotropy due to its high magnetocrystalline anisotropy and saturation magnetostriction constant. Therefore, it is important and essential to improve the soft magnetic properties and high-frequency characteristics of the FeCo alloy thin films.

In this thesis，a series of FeCo based alloy thin films were prepared by adding third element. By changing the sputtering gas pressure,three groups of examples are made.And the static and dynamic magnetic properties of these films were investigated  respectively to find out the influence of the gas pressure. The main conclusions are as follows：

(1)With the pressure increasing, both the anisotropy field and resonance frequency have minimums, while the initial permeability shows a maximum. The damping factor deceases monotonously with the pressure increasing, similar as with the coercivity.The high tunability of the damping factor indicates that controlling sputtering gas pressure could be an effective method in tuning the magnetization dynamics.

(2)Both the static soft magnetic properties and microwave characteristics of FeCoN thin films are found to be highly dependent on the pressure. With the pressure increasing , the resonance frequency monotonously decreases and the initial permeability monotonously increases.Both the coercivity and the damping factor shows a minimum. The resonance frequency shows an extraordinary large tunability with sputtering gas pressure.